Vacuum
Last updated ISSN 0042-207X
Vacuum is published by Elsevier BV in engineering. It is a subscription journal. The article processing charge is $2,860.
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What it publishes
Recent work in Vacuum concentrates on these topics, taken from its published record rather than from its own description:
- Metal and Thin Film Mechanics
- Plasma Diagnostics and Applications
- Semiconductor materials and devices
- Ion-surface interactions and analysis
- Electron and X-Ray Spectroscopy Techniques
- Diamond and Carbon-based Materials Research
- Scientific Measurement and Uncertainty Evaluation
- Vacuum and Plasma Arcs
- ZnO doping and properties
- Copper Interconnects and Reliability
Key facts
| Publisher | Elsevier BV |
|---|---|
| ISSN | 0042-207X, 1879-2715 |
| Subject area | Engineering |
| Access | Subscription |
| Article processing charge | $2,860 |
| Indexed in | Scopus |
| Articles published | 53,166 |
| Publishing since | 1951 |
| Journal website | www.journals.elsevier.com/vacuum |
Facts come from OpenAlex, DOAJ and Wikidata and may lag the journal’s own pages. Check the publisher’s site before submitting. Indexing shown here is what is recorded, not a complete picture — about a third of journals have no indexing recorded anywhere we can read, so “not recorded” does not mean a journal is absent from Scopus or Web of Science.
Journals like Vacuum
Other established journals in engineering, if this one is not the right home for your paper: