Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Last updated ISSN 0734-2101
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films is published by American Institute of Physics in engineering. It is a subscription journal. Its article processing charge is not published.
Is your paper a fit?
The surest way to know is to compare your own abstract against what this journal has actually been publishing, rather than against its aims-and-scope page. Paste your abstract and Journal Hunt will tell you how close Journal of Vacuum Science & Technology A Vacuum Surfaces and Films is — and show you journals like it.
What it publishes
Recent work in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films concentrates on these topics, taken from its published record rather than from its own description:
- Semiconductor materials and devices
- Metal and Thin Film Mechanics
- Plasma Diagnostics and Applications
- Ion-surface interactions and analysis
- Diamond and Carbon-based Materials Research
- Electron and X-Ray Spectroscopy Techniques
- Copper Interconnects and Reliability
- ZnO doping and properties
- Surface and Thin Film Phenomena
- Electronic and Structural Properties of Oxides
Key facts
| Publisher | American Institute of Physics |
|---|---|
| ISSN | 0734-2101, 1520-8559 |
| Subject area | Engineering |
| Access | Subscription |
| Article processing charge | Not published |
| Indexed in | Scopus |
| Articles published | 18,159 |
| Publishing since | 1983 |
Facts come from OpenAlex, DOAJ and Wikidata and may lag the journal’s own pages. Check the publisher’s site before submitting. Indexing shown here is what is recorded, not a complete picture — about a third of journals have no indexing recorded anywhere we can read, so “not recorded” does not mean a journal is absent from Scopus or Web of Science.
Journals like Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Other established journals in engineering, if this one is not the right home for your paper: